Ferroelectric thin films:basic properties and device physics for memory applications
Publication details: Berlin, Heidelberg: Springer-Verlag; 2005Description: xiii, 244 p. 23 cmISBN:- 3540241639(hb)
- 621.39732 OKU-ISH
Item type | Current library | Call number | Status | Date due | Barcode | |
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Books | Goa University Library General Stacks | 621.39732 OKU-ISH (Browse shelf(Opens below)) | Available | 145134 |
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621.395 VAI/Vls VLSI design | 621.395 WOJ/Vls VLSI :circuits for emerging applications | 621.3950285 SAR/Tec Technology Computer Aided Design : Simulation for VLSI MOSFET | 621.39732 OKU-ISH Ferroelectric thin films:basic properties and device physics for memory applications | 621.39732 SCH/Nan Nanometer CMOS | 621.47 DUF-BEC Solar Engineering of Thermal Processes | 621.47 DUF-BEC Solar Engineering of Thermal Processes |
Includes references and index.
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